用於合成MoS2(和其他TMD材料)的planarGROW高溫CVD系統是一水平式爐管加熱反應器,與石墨烯的合成不同的是,MoS2乃是以固體源(通常是硫粉和MoO3粉末)作為前驅物,可以直接沉積到 SiO2等目標基材上。 planarTECH提供標準的2吋CVD系統 (planarGROW-2S-MoS2),亦可依客戶的特定應用要求進行客製化。
planarGROW-2S-MoS2 CVD系統規格
QUARTZ TUBE & FURNACE • Quartz Tube Dimensions: ф50(OD)*1000 mm • Water Jacket Vacuum Plugs with Viton O-rings • Heating Element: Kanthal Wire, Glass Wool Molding • Maximum Temp: 1,000°C, K-type Thermocouple • Heating Zone: 2-zones, ф50*300mm Each • Alumina Tray + Wafer Tray for 10x10mm2 Samples GAS SUPPLY UNIT • One (1) Celerity TN2900 Mass Flow Controller o Argon (Ar): 1,000sccm • Open Mounting Bay for Second (2nd) MFC |
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• ¼” Stainless Steel Tubing • Two (2) ¼” Pneumatic-Type Diaphragm Valves VACUUM & PRESSURE CONTROL UNIT • Atovac CG201 Convection Gauge • Atovac CG2000 Vacuum Gauge & Controller • GPC3000 Pressure & Flow Controller • Alcatel Dry Pump (400 liter/m) w/ Cold Trap SYSTEM CONTROL UNIT • MS Windows XP Pro Embedded PC o Intel 3.0Ghz Core2Duo, 2GB Memory • PLC Module with National Inst. LabVIEW Interface • Samsung E1920R 19” LCD Monitor |
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SAFETY & COOLING • Water Cooled End Flanges • Buzzer Alarm & System Error Display • Interlock System
DIMENSIONS & UTILITY REQUIREMENTS • Footprint: 1.5m (W) x 1.50m (H) x 0.80m (D) • Weight: ~200kg • Power: 220V, 50/60Hz, 3Φ, 4-wire, 30A • Air: 4-5kgf/cm2, ¼” tube • Water: 2-3kgf/cm2, ½” tube |
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