Pioneer Engineering in Thin-Film Technologies
Founded in 1991 by a group of Dresden-based engineers, FHR Anlagenbau GmbH is an innovative company focused on vacuum process technology and special plant construction. Using their many years of experience in thin film technology, our engineers create both state-of-the-art solutions for thin film applications and tailor-made plant designs.
Our core skills in thin-film technology
- Reactive and non-reactive magnetron sputtering, vapour deposition under vacuum, CVD and PECVD processes for highly efficient deposition of metals, oxides and nitrides.
- Plasma-enhanced etching technologies for surface treatment and ultra-efficient material removal (high-rate etching).
- Atomic layer deposition for cutting ultra-thin functional layers of homogenous layer thickness on complex 3D-surface structures
Our core skills in special plant construction
- Cluster systems for the treatment and coating of small-area substrates and wafers
- Roll-to-roll systems for the coating of foils and flexible substrates (web coating)
- Inline systems for large-area deposition and coating of architectural glass plates
- ALD reactors for atomic layer deposition
- Plasma sources and gas regulation systems
- Sputter targets, individually made and bonded to cooling bodies
